ベラジョンメンテナンス

<ウェブサイト名>

<現在の時刻>

出典: 標準

About Overview Organization & Management Strategy Open Positions Movie Library Access Research Structure Researchers & Laboratories Research Areas Three Advanced Target Projects Collaboration Achievements Press Releases Media & Award AIMResearch Publications Topics News Seminars & Symposium International Satellites International Partner Institutions Inter-Faculty Exchange Agreements Researcher Exchange Programs Support Support Systems For International Researchers (IAC) For Visitors Researchers for Visitors for Researchers for Enterprise Access AIMR Fund Japanese Press Releases New Material Shows Promise for Next-Generation Memory Technology 06/30/2023 Updated 07/10/2023 Phase change memory is a type of nonvolatile memory that harnesses a phase change material’s (PCM) ability to shift from an amorphous state, i.e., where atoms are disorganized, to a crystalline state, i.e., where atoms are tightly packed close together. This change produces a reversible electrical property which can be engineered to store and retrieve data. Whilst this field is in its infancy, phase change memory could potentially revolutionize data storage because of its high storage density, faster read and write capabilities, and scalability. But still, the complex switching mechanism and intricate fabrication methods associated with these materials have posed challenges for mass production. In recent years, two-dimensional (2D) Van Der Waals (vdW) transition metal di-chalcogenides have emerged as a promising PCM for usage in phase change memory. Now, a group of researchers from Tohoku University has highlighted the potential use of sputtering to fabricate large-area 2D vdW tetra-chalcogenides. Using this technique, they fabricated and identified an exceptionally promising material—niobium telluride (NbTe4)—that exhibits an ultra-low melting point of approximately 447 °C (onset temperature), setting it apart from other TMDs. “Sputtering is a widely used technique that involves depositing thin films of a material onto a substrate, enabling precise control over film thickness and composition,” explains Yi Shuang, assistant professor at Tohoku University’s Advanced Institute for Materials Research and co-author of the paper. “Our deposited NbTe4 films were initially amorphous, but could be crystallized to a 2D layered crystalline phase by annealing at temperatures above 272 °C.” Unlike conventional amorphous-crystalline PCMs, such as Ge2Sb2Te5 (GST), NbTe4 demonstrates both a low melting point and a high crystallization temperature. This unique combination offers reduced reset energies and improved thermal stability at the amorphous phase. A comparison of Tc and Tm values of various 2D TM chalcogenides; The Tc and Tm values of NbTe4 were defined by the onset temperature of crystallization and melting peaks in this study. ©Yi Shuang et al. After fabricating the NbTe4s, the researchers then evaluated its switching performance. It exhibited a significant reduction in operation energy compared to conventional phase-change memory compounds. The estimated 10-year data retention temperature was found to be as high as 135 °C - better than the 85 °C of GST - suggesting an excellent thermal stability and the possibility of NbTe4 to be used in high-temperature environments such as in the automotive industry. Additionally, NbTe4 demonstrated a fast-switching speed of approximately 30 nanoseconds, further highlighting its potential as a next-generation phase change memory. “We have opened up new possibilities for developing high-performance phase change memories,” adds Shuang. “With NbTe4’s low melting point, high crystallization temperature, and excellent switching performances, it is positioned as the ideal material to address some of the current challenges face by current PCMs.” Details of the group’s discovery were published in the journal Advanced Materials on June 20, 2023. A selected area electron diffraction and Crossectional TEM image of as-deposited and 350 °C annealed NbTe4 thin films. ©Yi Shuang et al. Publication Details Title: NbTe4 Phase-Change Material: Breaking the Phase-Change Temperature Balance in 2D van der Waals Transition-metal Binary Chalcogenide Authors: Yi Shuang, Qian Chen, Mihyeon Kim, Yinli Wang, Yuta Saito, Shogo Hatayama, Paul Fons, Daisuke Ando, Momoji Kubo, and Yuji Sutou Journal: Advanced Materials DOI: 10.1002/adma.202303646 Contact Yi ShuangAdvanced Institute for Materials Research (WPI-AIMR) E-mail: shuang.yi.e3&#64;tohoku.ac.jp Webstie: Sutou Laboratory Yuji SutouDepartment of Materials Science, Graduate School of EngineeringAdvanced Institute for Materials Research (WPI-AIMR) E-mail: ysutou&#64;material.tohoku.ac.jp Tweet Achievements Press Releases 2024 2023 2022 2021 2020 2019 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 Media & Award 2024 2023 2022 2021 2020 2019 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 AIMResearch About AIMResearch Research Highlights 2024 2023 2022 2021 2020 2019 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 In the Spotlight 2019 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 Email Alert Sign up Publications Headlines 05/22/2024 Machine Learning Accelerates Discovery o... 05/16/2024 New Data-Driven Model Rapidly Predicts D... 05/15/2024 Researchers Unlock Vital Insights into M... Home Achievements Press Releases 2023 New Material Shows Promise for Next-Generation Memory Technology TOHOKU UNIVERSITY World Premier International Research Center Initiative For AIMR Members Link Site map Copyright © 2020 Tohoku University. All Rights Reserved.

ウェストハム対クリスタル・パレス 香港カップブックメーカー rtpとはカジノ 【188BETの💰豪華ボーナスを獲得してプレイ!】2024年
Copyright ©ベラジョンメンテナンス The Paper All rights reserved.